论文标题
散射寿命在封闭的MOS2纳米层中散射寿命的强填充依赖性,由Intervalley散射通道的开放引起
Strong band-filling-dependence of the scattering lifetime in gated MoS2 nanolayers induced by the opening of intervalley scattering channels
论文作者
论文摘要
封闭的钼二硫化物(MOS2)在增加电子掺杂时表现出丰富的相图,包括超导阶段,带子结构的极化重建以及远离2H多型的结构过渡。两个电荷携带散射事件之间的平均时间 - 散射寿命 - 是描述电荷传输并获得这种复杂系统行为的物理见解的关键参数。在这项工作中,我们将Boltzmann传输方程的解(基于Ab-Initio密度的功能理论计算电子带结构的计算)与有关电荷载体迁移率的实验结果,以确定Gated Mos2 Nanolayers中的散射寿命作为电子掺杂和温度的功能。从这些依赖项中,我们在增加带填充带后评估了电荷载体散射的主要来源,并发现了两个狭窄的电子掺杂范围,其中散射寿命得到了强烈抑制。我们缩减了连接布里群区域中同时填充的K/K'和Q/Q'valleys的其他间隔散射通道的打开,这是这些减少的来源,这是由高能Q/Q'valleys填充在增加电子掺杂时的两个Lifshitz过渡引起的。
Gated molybdenum disulphide (MoS2) exhibits a rich phase diagram upon increasing electron doping, including a superconducting phase, a polaronic reconstruction of the bandstructure, and structural transitions away from the 2H polytype. The average time between two charge-carrier scattering events - the scattering lifetime - is a key parameter to describe charge transport and obtain physical insight in the behavior of such a complex system. In this work, we combine the solution of the Boltzmann transport equation (based on ab-initio density functional theory calculations of the electronic bandstructure) with the experimental results concerning the charge-carrier mobility, in order to determine the scattering lifetime in gated MoS2 nanolayers as a function of electron doping and temperature. From these dependencies, we assess the major sources of charge-carrier scattering upon increasing band filling, and discover two narrow ranges of electron doping where the scattering lifetime is strongly suppressed. We indentify the opening of additional intervalley scattering channels connecting the simultaneously-filled K/K' and Q/Q' valleys in the Brillouin zone as the source of these reductions, which are triggered by the two Lifshitz transitions induced by the filling of the high-energy Q/Q' valleys upon increasing electron doping.