论文标题

高性能软X射线关键角度传输光栅的体积制造

Toward volume manufacturing of high-performance soft x-ray critical-angle transmission gratings

论文作者

Heilmann, Ralf K., Bruccoleri, Alexander R., Song, Jungki, Cook, Matthew T., Gregory, James A., Lambert, Renee D., Shapiro, Dimitri A., Young, Douglas J., Bradshaw, Miranda, Burwitz, Vadim, Hartner, Gisela D., Langmeier, Andreas, Smith, Randall K., Schattenburg, Mark L.

论文摘要

高分辨率($ r =λ/δλ> 2000 $)X射线的吸收和发射线光谱法是探索无处不在的温暖和热等离子体及其在宇宙网络中的动力学的特性的至关重要的诊断。 $ r> 10 {,} 000 $的软X射线光谱光谱已通过关键角传输(CAT)光栅证明。猫的光栅结合了松弛的比对和温度公差和低衍射效率的高质量效率。它们是拟议中的Arcus Grating Explorer的促成技术,并被选为Lynx设计参考任务光谱仪仪器。 Arcus和Lynx都需要数百美元的制造至2000美元的大区域猫栅栏。我们正在开发新的模式和制造过程序列,这些序列有助于在最先进的200 mm晶圆工具上进行大型体积处理。最近,使用电子束编写的面膜和4倍的投影光刻对200 nm - 周期光栅进行了X射线测试,并与硅孔聚焦光学元件结合使用,证明了$ r \ r \ r \ r \ r \ y \ 10^4 $在1.49 kev。预计将光栅深度从4 $ $ m延长到6 $μm$ M的范围可显着提高衍射效率,并且是我们目前使用深的反应式离子蚀刻和KOH溶液中湿蚀刻的组合的一部分。我们描述了我们最近在光栅制造方面的进展,并报告了我们最新的衍射效率和建模结果。

High-resolution ($R = λ/Δλ> 2000$) x-ray absorption and emission line spectroscopy in the soft x-ray band is a crucial diagnostic for the exploration of the properties of ubiquitous warm and hot plasmas and their dynamics in the cosmic web, galaxy clusters, galaxy halos, intragalactic space, and star atmospheres. Soft x-ray grating spectroscopy with $R > 10{,}000$ has been demonstrated with critical-angle transmission (CAT) gratings. CAT gratings combine the relaxed alignment and temperature tolerances and low mass of transmission gratings with high diffraction efficiency blazed in high orders. They are an enabling technology for the proposed Arcus grating explorer and were selected for the Lynx design reference mission grating spectrometer instrument. Both Arcus and Lynx require the manufacture of hundreds to perhaps $\approx 2000$ large-area CAT gratings. We are developing new patterning and fabrication process sequences that are conducive to large-format volume processing on state-of-the-art 200 mm wafer tools. Recent x-ray tests on 200 nm-period gratings patterned using e-beam-written masks and 4x projection lithography in conjunction with silicon pore focusing optics demonstrated $R \approx 10^4$ at 1.49 keV. Extending the grating depth from 4 $μ$m to 6 $μ$m is predicted to lead to significant improvements in diffraction efficiency and is part of our current efforts using a combination of deep reactive-ion etching and wet etching in KOH solution. We describe our recent progress in grating fabrication and report our latest diffraction efficiency and modeling results.

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